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A surface micromachining technique of LiNbO3 substrates, based on an improved implantation-assisted wet etching process, will be presented and discussed. 2.3 μm high relief structures with optical quality surfaces were fabricated on LiNbO3 by 5 MeV Cu ion implantation through an SU-8 10 μm thick photoresist masking layer patterned by a standard photolithographic process. The LiNbO3 regions amorphized by implantation were etched in a 49% HF aqueous solution at a rate of 100 nm/s exploiting the high differential etching rate between damaged and undamaged LiNbO3 (100 nm/s against 1 nm/s). The process can be repeated to obtain higher aspect ratios. In this work the results of both single and double step processes will be presented. The sidewalls morphology of the microstructures will be also discussed. Both the surface quality and features of the manufactured structures make this technology highly …
International Society for Optics and Photonics
Publication date: 
9 Mar 2013

Simone Sugliani, Pietro De Nicola, Giovanni Battista Montanari, Alessio Nubile, Angela Menin, Fulvio Mancarella, Paolo Vergani, Andrea Meroni, Marco Astolfi, Marco Borsetto, Guido Consonni, Roberto Longone, Marco Chiarini, Marco Bianconi, Gian Giuseppe Bentini

Biblio References: 
Volume: 8612 Pages: 86120E
Micromachining and Microfabrication Process Technology XVIII