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Doping and stability of monolayer low defect content graphene transferred on a silicon dioxide substrate on silicon are investigated by micro-Raman spectroscopy and atomic force microscopy (AFM) during thermal treatments in oxygen and vacuum controlled atmosphere. The exposure to molecular oxygen induces graphene changes as evidenced by a blue-shift of the G and 2D Raman bands, together with the decrease of I2D/IG intensity ratio, which are consistent with a high p-type doping (∼1013 cm–2) of graphene. The successive thermal treatment in vacuum does not affect the induced doping showing this latter stability. By investigating the temperature range 140–350 °C and the process time evolution, the thermal properties of this doping procedure are characterized, and an activation energy of ∼56 meV is estimated. These results are interpreted on the basis of molecular oxygen induced ∼1013 cm–2 p …
American Chemical Society
Publication date: 
1 Oct 2015

A Piazza, F Giannazzo, G Buscarino, G Fisichella, A La Magna, F Roccaforte, M Cannas, FM Gelardi, S Agnello

Biblio References: 
Volume: 119 Issue: 39 Pages: 22718-22723
The Journal of Physical Chemistry C