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Tailoring surface energies is the key factor to control the orientation of nanoscopic structures in thin block copolymer (BCP) films. In the general frame of the “grafting to” approach, this paper reports on the use of Rapid Thermal Processing (RTP) technology to perform flash grafting reactions of a hydroxyl terminated poly(styrene-r-methylmethacrylate) random copolymer to the activated silicon wafer surface. The perpendicular orientation of the cylindrical morphology of an asymmetric PS-b-PMMA block copolymer is achieved when the thickness of the random copolymer layer is higher than 6.0 nm. The grafting time to achieve this thickness reduces from about 750 s, when the RTP grafting process is performed at 230 °C, to 15 s at 310 °C. For a symmetric PS-b-PMMA block copolymer, the perpendicularly oriented lamellar morphology is obtained when the random layer thickness is higher than 3.5 nm, that is after 60 s …
Royal Society of Chemistry
Publication date: 
1 Jan 2014

F Ferrarese Lupi, TJ Giammaria, G Seguini, M Ceresoli, M Perego, D Antonioli, V Gianotti, K Sparnacci, M Laus

Biblio References: 
Volume: 2 Issue: 25 Pages: 4909-4917
Journal of Materials Chemistry C