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The chapter provides an overview of recent advances in lithography for the production of integrated circuits (ICs)Integrated circuits (ICs). In the first section of the chapter, a brief introduction about lithography basics such as image formation, image resolution in projection systems, and resolution enhancement techniques is provided. In the following section, advanced lithography based on ArF 193 nm deep-UV (DUV)Deep-UV (DUV) sources is discussed thoroughly, including photoresist requirements and characteristics, plasma etching selectivity, and the multiple patterning techniques commonly adopted for resolution enhancement in these processes. After mentioning some non-optical lithographic methods such as electron beam lithographyElectron Beam Lithography (EBL) and nanoimprint lithographyNano-Imprint Lithography (NIL), which are mainly employed for mask fabrication or niche applications, a detailed …
Springer, Cham
Publication date: 
1 Jan 2023

Alberto Roncaglia

Biblio References: 
Pages: 279-308
Springer Handbook of Semiconductor Devices