-A A +A
Type: 
Journal
Description: 
X-ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano-layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer. Copyright© 2012 John Wiley & Sons, Ltd.
Publisher: 
Publication date: 
1 Aug 2012
Authors: 

E Ravizza, S Spadoni, R Piagge, P Comite, C Wiemer

Biblio References: 
Volume: 44 Issue: 8
Origin: 
Surface & Interface Analysis: SIA