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The B lattice location in presence of a Si-self-interstitial (ISi) supersaturation, controlled by energetic proton bombardment, has been studied by means of ion channelling and massive Monte Carlo simulations. B-doped layers of Si crystals with a B concentration of 1 × 1020 B/cm3 were grown by Molecular Beam Epitaxy. Point defect engineering techniques, with light energetic ion implants, have been applied to generate an ISi uniform injection in the electrically active layer. The displacement of B atoms out of substitutional lattice sites was induced by 650 keV proton irradiations at room temperature (R.T.) and the resultant defect configuration was investigated by ion channelling and Nuclear Reaction Analysis (NRA) techniques. Angular scans were measured both through and axes along the (1 0 0) plane using the 11B(p,α)8Be nuclear reaction at 650 keV proton energy. Monte Carlo simulated …
Publication date: 
5 Dec 2005

AM Piro, L Romano, S Mirabella, MG Grimaldi

Biblio References: 
Volume: 124 Pages: 249-252
Materials Science and Engineering: B