In this work we propose an alternative methodology to study B diffusion in crystalline Ge. We enhance B diffusion by means of passing implants in such a way to increase the point-defects distribution through the sample, well above the equilibrium value. A comparison between B diffusion occurring under implantation with different ions or after post-implantation annealing allowed to discern any possible role of ionization effects on B diffusion. Indeed, B diffusion is demonstrated to occur through a point-defect-mediated mechanism. The diffusion mechanism is hence discussed. These results are a key point for a full comprehension of the B diffusion in Ge.