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Very smooth relief microstructures were fabricated in X-cut Lithium Niobate by using an improved ion implantation-assisted wet etching technique. The substrates were implanted with 5 MeV Cu ions at a fluence of 1 × 10^15 cm^-2 through a masking layer. Three kinds of layers were patterned and tested: Au, positive photoresist and SU-8 negative photoresist. The damaged regions were then etched with a HF solution at a rate of 100 nm/s. The process can be repeated to obtain higher aspect ratios. The relief structures fabricated with this technology are presented and discussed. In order to explore a possible application of our technique optical waveguides were created in the best quality structures by means of a multi-step carbon ion implantation process with ten different energies followed by an annealing at 280°C for 30 minutes. In this way a step …
Publication date: 
1 May 2013

P De Nicola, S Sugliani, GB Montanari, A Menin, P Vergani, A Meroni, M Astolfi, M Borsetto, G Consonni, R Longone, A Nubile, M Chiarini, M Bianconi, GG Bentini

Biblio References: 
Volume: 31 Issue: 9 Pages: 1482-1487
Journal of Lightwave Technology