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A definitive method to prevent undesired phenomena related to B implantation in crystalline Si is still lacking. In fact, B undergoes enhanced diffusion, clustering and electrical deactivation as a consequence of interaction with implantation related damage. In this work we investigated the effect of He and B co-implantation in Si on point-defect population. We implanted Si wafers with B 12 keV, 5 × 1014 ions/cm2 and/or He 25–80 keV, 0.5–3 × 1016 ions/cm2. By means of B diffusion and Cu gettering experiments, we studied the effectiveness of He induced nanovoids on controlling self-interstitials generated by implantation. We demonstrated that nanovoids strongly affect B diffusion, producing a B box-like shape, and that their efficiency increases with increasing He fluence. Moreover, this beneficial effect is still present increasing the annealing temperature from 700 to 1000 °C, leading to a reduction of B clustering …
Publication date: 
1 Apr 2007

E Bruno, S Mirabella, E Napolitani, F Giannazzo, V Raineri, F Priolo

Biblio References: 
Volume: 257 Issue: 1-2 Pages: 181-185
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms