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The potential of sputtered Ta2O5 thin films to be used as dielectric layers in capacitive radio frequency microelectromechanical system switches is evaluated by investigating two factors of crucial importance for the performance of these devices which are the transport mechanisms and the charging effects in the dielectric layer. We find that Ta2O5 films show good electrical and dielectrical properties for the considered application in terms of a low leakage current density of 4 nA/cm2 for E=1 MV/cm, a high breakdown field of 4 MV/cm and a high dielectric constant of 32. For electric fields lower than 1 MV/cm the conduction mechanism is found to be variable-range hopping in the temperature range 300–400 K, while nearest-neighbor hopping is observed at higher temperatures. For fields in the range 1–4 MV/cm Poole–Frenkel becomes the dominant conduction mechanism. Current and capacitance transients used …
American Institute of Physics
Publication date: 
1 Jun 2010

A Persano, F Quaranta, MC Martucci, P Cretì, P Siciliano, A Cola

Biblio References: 
Volume: 107 Issue: 11 Pages: 114502
Journal of Applied Physics